Surface characterization results at the nanometer level will be significantly impacted depending on the imaging technique applied. We use a several Sensofar surface analysis tools to measure and characterize surfaces in our lab. We occasionally use a confocal technology, a focus variation technology, or interferometry. Each has its place, and we are fortunate to have the tools to incorporate all these methods.
3 Modes of Interferometry [VIDEO TUTORIAL]
Check out this detailed video tutorial showing how we characterizes a wafer utilizing this technology. The video covers:
- PSI – Phase Shifting Interferometry
- ePSI – Extended Phase Shifting Interferometry
- CSI – Coherence Scanning Interferometry
